Other articles related with "leakage current density":
127703 Lin Zhou(周琳), Lu Liu(刘璐), Yu-Heng Deng(邓煜恒), Chun-Xia Li(李春霞), Jing-Ping Xu(徐静平)
  Improved interfacial properties of HfGdON gate dielectric Ge MOS capacitor by optimizing Gd content
    Chin. Phys. B   2019 Vol.28 (12): 127703-127703 [Abstract] (447) [HTML 1 KB] [PDF 1950 KB] (114)
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